Lecture 1 - General Introduction of Course
Lecture 2 - Historical Perspective on IC Technology
Lecture 3 - Scaling Trends in IC Fabrication
Lecture 4 - Moore's Law
Lecture 5 - Scaling of MOSFET
Lecture 6 - Enablers of VLSI Technology - Part I
Lecture 7 - Enablers of VLSI Technology - Part II
Lecture 8 - Some Background Information
Lecture 9 - Planar Processing of n+-p Diode
Lecture 10 - CMOS Processing - Masks Involved
Lecture 11 - CMOS Planar Processing - Part I
Lecture 12 - CMOS Planar Processing - Part II
Lecture 13 - A Glimpse of Advanced FET Structure Evolution
Lecture 14 - IC Packaging - Far Back End of Line
Lecture 15 - Vacuum Systems - Part I
Lecture 16 - Vacuum Systems - Part II
Lecture 17 - Plasma for Semiconductor Processing
Lecture 18 - Crystalline Substrates - Part I
Lecture 19 - Crystalline Substrates - Part II
Lecture 20 - Crystalline Silicon Substrates
Lecture 21 - Silicon on Insulator (SOI) Substrates
Lecture 22 - GaAs and Other Substrates
Lecture 23 - Oxidation of Silicon - Part I
Lecture 24 - Oxidation of Silicon - Part II
Lecture 25 - Thermal Nitridation of Silicon
Lecture 26 - Diffusion - Part I
Lecture 27 - Diffusion - Part II
Lecture 28 - Diffusion - Part III
Lecture 29 - Ion Implantation - Part I
Lecture 30 - Ion Implantation - Part II
Lecture 31 - Thin Film Process
Lecture 32 - Chemical Vapour Deposition (CVD) - Part I
Lecture 33 - Chemical Vapour Deposition (CVD) - Part II
Lecture 34 - Physical Vapour Deposition (PVD)
Lecture 35 - Lithography
Lecture 36 - Etch Process
Lecture 37 - Statistical Tools for Processing
Lecture 38 - Concluding Comments
